日本製鋼所「技報74号」
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ECR-CVD技術の開発(4) A. Boes, L. Chang, T. Nguyen, G. Ren, J. Bowers, and A. Mitchell: “Efficient second harmonic generation in lithium niobate on insulator waveguides and its pitfalls”, J. Phys. Photonics, Vol. 3 (2021) No. 1, p. 012008(5) N. Margalit, C. Xiang, S. M. Bowes, A. Bjorlin, R. Blum, and J. E. Bowers: “Perspective on the future of silicon photonics and electronics”, Appl. Phys. Lett. Vol. 118 (2021) No. 22, p. 220501(6) S. Matsuo and M. Kikuchi: “Low Temperature Chemical Vapor Deposition Method Utilizing an Electron Cyclotron Resonance Plasma”, Jpn. J. Appl. Phys. Vol.22 (1983) No. 4, pp. L210-L212(7) T. Ono, H. Nishimura, M. Shimada, and S. Matsuo: “Electron cyclotron resonance plasma source for conductive film deposition”, J. Vac. Sci. Technol. A, Vol. 12(1994) No. 4, pp. 1281-1286(8) Y. -J. Kim, R. Tateno, T. Ikura, K. Matsuda, H. Kawai, M. Suzuki, and K. Goto: “Electron Cyclotron Resonance (ECR) Sputtered Antireflection Coatings on Laser Facets for Optical Memory Applications”, Jpn. J. Appl. Phys. Vol. 37 (1998) No. 45, pp. 2201-2202(9) K. Wakita and S. Matso: “Small Surface Damage Facet Coating on InGaAsP/InP Laser by ECR Plasma Deposition”, Jpn. J. Appl. Phys. Vol. 23 (1984) No. 8, p. L556(10) 田中こずえ, 鳥居博典,嶋田勝:“φ300 mm基板対応固体ソースプラズマ成膜装置の開発”, 日本製鋼所技報, No. 69 (2018), pp. 82-87(11) T. Tsuchizawa, Y. Jin, and S. Matsuo: “Kinetic-energy measurement of a neutral stream extracted from Ar electron cyclotron resonance plasma”, Appl. Phys. Lett. Vol. 69 (1996) No.2, pp. 149-151(12) S. Nowak, P. Gröning, O. M. Küttel, M. Collaud, and G. Dietler, “Electron cyclotron resonance plasma experiment for in situ surface modification, deposition, and analysis”, J. Vac. Sci. Technol. A, Vol. 10 (1992) No. 6, pp. 3419-3425(13) S. Guruvenket, G. M. Rao, M. Komath, and A. M. Raichur: “Plasma surface modification of polystyrene and Polythylene”, Appl. Surf. Sci. Vol. 236 (2004), pp. 278-284(14) D. - H. Han, S. Ohmi, T. Suwa, P. Gaubert, and T. Ohmi: “Influence of Si Surface Roughness on Electrical Characteristics of MOSFET with HfON Gate Insulator Formed by ECR Plasma Sputtering”, IEICE Trans. Electron., Vol. E97–C (2014) No. 5, pp. 413-418(72)(15) 辻直人,髙橋聡: “均一な膜を形成するためのプラズマCVD装置及び方法”, 特開2007-53359 (2007)(16) R. Takigawa and T. Asano: “Thin-film lithium niobate-on-insulator waveguides fabricated on silicon wafer by room-temperature bonding method with silicon nanoadhesive layer”, Opt. Express, Vol. 26 (2018) No. 19, pp. 24413-24421(17) M. Bahadori, Y. Yang, A. E. Hassanien, L. L. Goddard, and S. Gong: “Ultra-efficient and fully isotropic monolithic microring modulators in a thin-film lithium niobate photonics platform”, Opt. Express, Vol. 28 (2020) No. 20, pp. 29644-29661(18) G. Poberaj, H. Hu, W. Sohler, and P. Günter: “Lithium niobate on insulator (LNOI) for micro-photonic devices”, Laser Photonics Rev., Vol. 6 (2012) No. 4, pp. 488-503(19) D. Lowney, T. S. Perova, M. Nolan, P. J. McNally, R. A. Moore, H. S. Gamble, T. Tuomi, R. Rantamäki, and A. N. Danilewsky: “Investigation of strain induced effects in silicon wafers due to proximity rapid thermal processing using micro-Raman spectroscopy and synchrotron x-ray topography”, Semicond. Sci. Technol., Vol. 17 (2002)No. 10, pp. 1081-1089(20) S. M. Hu: “Defects in silicon substrates”, J. Vac. Sci.Technol., Vol. 14 (1977) No. 1, pp. 17-31

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